C3 Corporation
MicroClean Cryogenic Cleaning System
- Eliminates residues and contaminants created during semiconductor manufacturing
- Uses CO2 to remove silicon dioxide, oxides, nitrides, polysilicon residues, dopants, aluminum and polymers
- Non-abrasive to even the most delicate components
- Environmentally friendly, safe and cost-effective
- Various nozzle combinations available
- Highly recommended for tougher cleaning jobs
Download the data sheet
MicroClean crypgenic cleaning system
