Lightwind Process Solutions
Lightwind technology focuses on process chemistry as it changes real time. Lightwind has a patented ICP OES sensor which can continuously monitor almost any process gas while in most cases not requiring any maintenance. Gases such as ClF3, or Atomic Layer Deposition precursors can be analyzed continuously. Monitoring the process chemistry is the only way to understand the chemical process the wafer is exposed to and the quality of the wafer produced.
Software for visualizing and understanding high value OES data is the second major focus for Lightwind technology. Their software is designed to be visual for realtime interaction as well as able tio interface with existing factory automation schemes.
Products
- Ocean Optics Metrology
- Ocean Optics Sensors
- Lightwind L3
- Lightwind S3
- Lightwind Vector Software
Applications
- ALD precursor level
- Leaks
- Etch endpoint
- Chamber matching
- RF troubleshooting
- RF arc detection
- Virtual metrology
Process Chemistry Map for TiN Deposition showing 5 deposition steps
followed by the start of an idle cycle.
