Semitherm/Thermco

Semitherm vertical diffusion furnaces

Vertical diffusion system for the processing of wafers up to 200mm
New industry-leading TMX controller
Efficient and robust automation utilizing industry-standard robotics and a pneumatically operated jar/element lift mechanism
A process tube replacement time of < 15 minutes means the element can remain hot and removes the need for reprofiling
High throughput using three tower load/unload system
Space efficient footprint
Configurations available for most applications including wet & dry oxidation, anneal, LPCVD, ultra thin gate dialectric, ultra low temp anneal for BEOL, and ultra low temp LCVD